Aera TC FC-D980CU MFC Mass Flow Controller, 300 SCCM, SF6, 112534

The Aera TC FC-D980CU Mass Flow Controller is a precision-engineered instrument designed for critical gas management in industrial and laboratory environments. Featuring a calibrated flow range of 300 SCCM specifically for SF6 gas, the model 112534 provides repeatable, accurate mass flow control required for delicate semiconductor manufacturing and chemical processing applications. This unit ensures stable gas delivery, supporting consistent process output and operational reliability in demanding vacuum and thin-film deposition systems.

Overview of the FC-D980CU Mass Flow Controller

The Aera FC-D980CU series is designed for users who require strict control over gas mass flow rates in sophisticated process environments. By measuring the actual mass of the gas rather than relying on volume, which is subject to temperature and pressure fluctuations, this controller maintains precision across varying environmental conditions. It is specifically intended for engineers and technicians managing gas distribution lines where SF6 is used as an etchant or plasma source. Its rugged design ensures it stands up to the rigorous duty cycles of 24/7 manufacturing environments while maintaining the calibration integrity essential for high-yield production.

Key Features of the Aera Controller

• Precision Mass Flow Measurement: Utilizes thermal mass flow sensing technology to provide accurate gas flow control independent of changes in upstream or downstream pressure.
• Specific Gas Calibration: This unit is factory-calibrated for SF6 gas, ensuring the PID loop and sensor response are optimized for the thermodynamic properties of sulfur hexafluoride.
• High-Speed Response Time: Engineered to achieve setpoint stabilization rapidly, reducing downtime during gas switching or ramp-up sequences in vacuum processes.
• Robust Construction: Built with high-purity materials compatible with harsh industrial process gases to maintain long-term device integrity and minimize potential contamination.
• Integrated Control Interface: Features standard industry-compatible electrical connectivity, allowing for seamless integration into existing tool control systems and PLC environments.

Technical Specifications

• Manufacturer: Aera
• Model/SKU: FC-D980CU
• Part Number: 112534
• Gas Type: SF6
• Full Scale Flow Range: 300 SCCM

Applications for Mass Flow Controllers

• Semiconductor Etching: Facilitates precise delivery of SF6 for reactive ion etching processes where gas flow ratios directly impact pattern fidelity.
• Plasma Enhanced Chemical Vapor Deposition (PECVD): Used to manage gas delivery to vacuum chambers where thin-film deposition uniformity depends on constant mass flow rates.
• Analytical Research: Supports controlled gas environments in specialized research chambers where precise metering of sulfur hexafluoride is required for experimental reproducibility.
• Industrial Gas Blending: Provides accurate flow control in multi-component gas manifolds, ensuring correct mixture ratios in complex process lines.

Compatibility & Cross-References

The Aera FC-D980CU series is designed for compatibility with common semiconductor tool interfaces. When evaluating the 112534 for replacement or system upgrades, verify the electrical pinout and mechanical fitting dimensions to ensure a direct fit into existing gas panels. This unit is intended to serve as a high-precision drop-in replacement for standard SF6 delivery lines in Aera-compatible architectures. Always refer to your tool system schematics when cross-referencing flow controllers to ensure compatibility with your specific process gas manifold configurations.

FAQ

What is the primary gas calibrated for this unit?

The Aera FC-D980CU model 112534 is specifically calibrated for SF6 gas at a maximum flow rate of 300 SCCM.

How does the FC-D980CU maintain accuracy?

The device utilizes thermal mass flow sensor technology, which measures the heat transfer from the gas molecules to determine the mass flow rate, ensuring stability despite pressure or temperature fluctuations.

Is this unit compatible with high-purity gas lines?

Yes, the construction materials are selected for compatibility with high-purity gas delivery systems, making it suitable for semiconductor and laboratory-grade processes.